张保国

张保国 教授

Email：bgzhang2000@yahoo.com

教育经历：

美国内华达州立大学，获冶金工程博士学位

武汉科技大学获硕士学位

武汉工程大学或学士学位

研究领域：

1、半导体材料的化学机械抛光，包括氮化镓、鍺，砷化镓等

2、倒装LED芯片中的关键技术研究

3、高效柔性太阳能电池的研究

承担研究课题：

[1] 化合物半导体氮化镓等新材料的CMP及清洗技术（E2013100006）, 河北省人社厅, 2014.1–2016.12，主持

[2] 倒装大功率LED芯片新技术的研究，河北省科技厅，2015.01 - 2017.12，主持

[3] 砷化镓晶体技术服务， 朝阳通美晶体科技有限公司，2020.12 - 2022.11，主持

[4] TEOS薄膜的化学机械抛光，上海新安纳电子科技有限公司，2021.7 - 2022.6，主持

[5] 用于蓝宝石晶片加工氧化铝抛光液的开发，重庆任丙科技有限公司， 2021.8 - 2022..7，主持

[6] 碳化硅抛光液研发技术服务，烟台显华高分子材料有限公司， 2022.12 - 2025.11，主持

[7] 第三代半导体CMP研磨抛光液，湖北金伟新材料有限公司 2024.5 - 2028.4，主持

[8] 氧化铈抛光液抛光技术服务，深圳市聚芯半导体材料有限公司，2023.3 - 2028.2，主持

[9] 氧化铈抛光液应用技术服务，广东聚芯半导体材料有限公司， 2024.1 - 2029.1，主持

学术论文：

[1] Dexing Cui, Baoguo Zhang, Wenhao Xian, Min Liu , Shitong Liu, Pengfei Wu, Ye Wang Comparative study on MnO2, Mn2O3, and Mn3O4:Enhancing chemical-mechanical polishing properties of 4H-SiC silicon wafers [J] Materials Science in Semiconductor Processing 191(2025):109359

[2] Sihui Qin, Min Liu, Baoguo Zhang, Wenhao Xian, Dexing Cui, Shitong Liu Promotive Effect of Organic Acids on the Dispersion of Ceria Slurry and the Removal Rate of TEOS in Chemical Mechanical Polishing [J] ECS Journal of Solid State Science and Technology 14(2025):014003

[3] Wenhao Xian, Baoguo Zhang,Min Liu, Dexing Cui, Shitong Liu Exploring the mechanism of gallium nitride surface quality enhancement by gree organic additives in chemical mechanical polishing [J] Applied SurfaceScience 670(2024):160646

[4] Dexing Cui, Baoguo Zhang, Wenhao Xian, Min Liu, Jiawei Wu, Shitong Liu, Sihui Qin, Yijun Wang, Yang Liu Unveiling the synergistic intetaction:Investigating the enhanced mechanism of 4H-SiC chemical mechanical polishing with the addition of sodium silicateand manganese dioxide [J] Materials Science in Semiconductor Processing 184(2024):108815

[5] Min Liu, Baoguo Zhang, Jihoon Seo, Wenhao Xian, Dexing Cui, Shitong Liu, Yijin Wang, Sihui Qin, Yang Liu Development of Highly stable ceria slurry in acetic acid-ammonium acetate buffer Media for effective chemical mechanical polishing of silicon dioxide [J] Materials Science in Semiconductor Processing 177(2024):108411

[6] Wenhao Xian, Baoguo Zhang,Min Liu, Pengfei Wu, Ye Wang, Shitong Liu, Dexing Cui Optimization and Mechanism of SiO2-Based Slurry Components for Atomically Smooth Gallium Nitride Surface Obtained Using Chemical Mechanical Polishing Technique [J] ECS Journal of Solid State Science and Technology 13(2024):014003

[7] Ye Wang, Baoguo Zhang, Pengfei Wu, Min Liu, Dexing Cui, Wenhao Xian Improving the Dispersion Stability and Chemical MechanicalPolishing Performance of CeO2 Slurries [J] ECS Journal of Solid State Science and Technology 12(2023):044004

[8] 王万堂，张保国，周佳凯，李浩然，李烨 长余辉发光粒子与光催化剂在SiC晶圆化学机械抛光中的协同作用 [J] Surface technology 09(2022):025109

[9] Pengfei Wu, Baoguo Zhang, Ye Wang, Mengchen Xie, Shitong Liu, Min Liu, Wenhao Xian, Dexing Cui, Kai Zhang Effect of synergetic inhibition of nonionic surface and benzotriazone for molybdenum in chemical mechanical polishing [J] Colloids and Surfaces A: Physicochemical and Engineering Aspects 664(2023):131164

[10] Ye Wang, Baoguo Zhang, Pengfei Wu, Mengchen Xie, Ye Li, Haoran Li Research on High-Efficiency Rare Earth Polishing Slurry for CMP of Optical Glass [J] Lubrication Engineering 05(2023):000

[11] Pengfei Wu, Baoguo Zhang, Haoran Li, Ye Wang, Mengchen Xie, Ye Li, Wantang Wang Study on inhibition effect of 3-amino-1,2,3-triazole on chemical mechanical polishing of GLSI low-techology node molybdenum barrier layer [J] Materials Science in Semiconductor Processing 162(2023):107474

[12] Pengfei Wu, Baoguo Zhang, Yunhui Shi, Mengchen Xie, Ye Wang, Dexing Cui, Min Liu, Wenhao Xian Study on synergetic effect of potassium pyrophosphate and benzotriazole on chemical mechanical planarization of GLSI low-technology node molybdenum barrier layer [J] Materials Science in Semiconductor Processing 168(2023):107830

[13] Qiming Zhang, Baoguo Zhang, Hongliang Guo, Yue Tang, Jian Song, Qiang Sun Low-intensity low-temperture(LILT)solar cells for deep space missions [J] Applied Physics 2022

[14] 李浩然，张保国，李烨，阳小帆，杨朝霞 焦磷酸钾和双氧水对化学机械抛光中铜/钴电偶腐蚀及去除速率的影响 [J] Electroplating and Finishing 01(2022):006705

[15] 杨朝霞，张保国，阳小帆，李烨，李浩然 高分散稳定性CeO2 抛光液的制备及其抛光性能研究 [J] Chinese Rare Earths 02(2022):012809

[16] Wantang Wang, Baoguo Zhang, Yunhui Shi, Dengke Zhou,Ru Wang Improvement in dispersion stability of alumina suspensions and corresponding chemical mechanical polishing performance [J] Applied Surface Science 597(2022):153703

[17] Wantang Wang, Baoguo Zhang, Yunhui Shi, Jiakai Zhou, Ru Wang, Nengyuan Zeng Improved chemical mechanicalpolishing performance in 4H-SiC substrate by combining novel mixed abrasive slurry and photocatalytic effect [J] Applied Surface Science 575(2022):151676

[18] Haoran Li, Baoguo Zhang, Ye Li, Pengfei Wu, Ye Wang, Mengchen Xie Effect of novel green inhibitor on corrosion and chemical mechanical polishing properties of cobalt in alkaline slurry [J] Materials Science in Semiconductor Processing 146(2022):106691

[19] Wei Wei, Baoguo Zhang, Li Zhang, Xuan Yu Study on Electrochemical Corrosion and CMP of GaN in Different Oxidation Systems [J] ECS Journal of Solid State Science and Technology 11(2022):034002

[20] Ye Li, Baoguo Zhang, Haoran Li, Pengfei Wu, Ye Wang, Mengchen Xie Effect of Alkali Metal Ion on Chemical Mechanical Polishing of LiTaO3 [J] ECS Journal of Solid State Science and Technology 11(2022):034003

[21] Xiaofan Yang, Baoguo Zhang,Zhaoxia Yang Study of novel chelator and 1,2,4-triazole on cobalt corrosion and Co/Cu surface finshing in barrier CMP [J] Materials Chemistry and Physics 278(2022):125630

[22] Zhaoxia Yang, Baoguo Zhang, Xiaofan Yang, Ye Li, Haoran Li Ceria-Based Abrasive Composite to Improve MRR of SiO2 in 3D-NAND [J] ECS Journal of Solid State Science and Technology 10(2021):093005

[23] Wantang Wang, Baoguo Zhang, Yunhui Shi, Teng Ma, Jiakai Zhou, Ru Wang, Hanxiao Wang, Nengyuan Zeng Improvement in chemical mechanical polishing of 4H-SiC wafer by activating persulfate through the synergistic effect of UV and TiO2 [J] Journal of Materials Processing Tech 295(2021):117150

[24] Qiming Zhang, Baoguo Zhang, Hongliang Guo, Yue Tang, Yanmei Wu, Rubin Liu, Heng Zhang, Liyong Yao, Qiang Sun MOVPE Growth and EQE Artifact Analysis of Upright Metamorphic Quadruple Junction Solar Cell [J] ECS Journal of Solid State Science and Technology 10(2021):025006

[25] Wantang Wang, Baoguo Zhang, Yunhui Shi, Tengda Ma, Jiakai Zhou, Ru Wang, Hanxiao Wang, Nengyuan Zeng Improvement in chemical mechanical polishing of 4H-SiC wafer by activating persulfate through the synergistic effect of UV and TiO2 [J] Journal of Materials Processing Tech 295(2021):117150

[26] 杨朝霞，张保国，阳小帆，李烨，李浩然 CeO2抛光液对SiO2介质的抛光性能 [J] Electroplating and Finishing 04(2021):024707

[27] 阳小帆，张保国，杨朝霞，李烨，李浩然 碱性阻挡层抛光液中ULK介质抛光性能的研究 [J] Electroplating and Finishing 02(2021):010207

[28] 韦伟，张保国，王万堂，李浩然，李烨 光催化氧化对GaN材料腐蚀电化学及化学机械抛光的影响 [J] Electroplating and Finishing 01(2021):004107

[29] 刘旭阳，张保国，王如 硅通孔化学机械平坦化中铜去除的电化学与选择性研究 [J] Electroplating and Finishing 09(2020):055406

[30] Baoguo Zhang, Chao Luo, Yunfei Li Damage-Free Transfer of GaN-Based Light-Emitting Devices and Reuse of Sapphire Substrate [J] ECS Journal of Solid State Science and Technology 09(2020):065019

[31] Xuan Yu, Baoguo Zhang, Ru Wang, Zhengxiao Kao, Shenghua Yang, Wei Wei Effect of photocatalysts on electrochemical properties and chemical mechanical polishing rate of GaN [J] Materials Science in Semiconductor Processing 121(2021):105387

[32] 于璇，张保国，考政晓，杨盛华，刘旭阳，韦伟 紫外光和催化剂对GaN电化学特性及CMP速率的影响 [J] Semiconductor Manufacturing Technologies 10(2019):078307

[33] 考政晓，张保国，于璇，杨盛华，王万堂，刘旭阳，韦伟，马腾达 单晶SiC电化学腐蚀及化学机械抛光 [J] Semiconductor Manufacturing Technologies 08(2019):062807

[34] Shenghua Yang, Baoguo Zhang, Chenwei Wang, Yangang He, Jianchao Wang, Ru Wang, Yuling Liu Effect of multi-functional amines on SiGe surface finish during chemical mechanical polishing [J] Materials Science in Semiconductor Processing 99(2019):114124

[35] Shenghua Yang, Baoguo Zhang, Qinming Zhang, Ru Wang, Xuan Yu, Chenwei Wang, Yuling Liu AStudy of Cobalt Galvanic and Pitting Corrosion with Combination of BTA and PMP [J] ECS Journal of Solid State Science and Technology 08(2019):416-422

[36] Li Zhang, Baoguo Zhang, Baichen Pan, Chenwei Wang Germanium electrochemical study and its CMP application [J] Applied Surface Science 422(2017):247-256

[37] Xuan Yu, Baoguo Zhang, Shuai Zhao, Zhengxiao Kao, Shenghua Yang, Xuyang Liu Enhancement of Heat Dissipation in LED Using Graphene and Carbon Nanotubes [J] ECS Journal of Solid State Science and Technology 07(2018):153-160

[38] Shenghua Yang, Baoguo Zhang, Chenwei Wang, Wenqian Zhang, Yuling Liu, Baohong Gao Studies on Electrochemical Characteristics of SiGe in Application to Chemical Mechanical Polishing [J] ECS Journal of Solid State Science and Technology 07(2018):213-220

[39] 张启明，张保国，孙强，方亮，王赫，杨盛华，张礼，罗超 AlGaInP材料在高效多结太阳能电池中的应用 [J] Semiconductor Technology 07(2018):0481-08

[40] 考政晓，叶大千，于璇，张保国 蓝宝石衬底材料的研究及应用进展 [J] Journal of synthetic crystals 01(2018):0102-06

[41] 罗超，张保国，孙强，张启明，张礼，缪玉欣，韩丽楠 晶圆键合技术在LED应用中的研究进展 [J] Semiconductor Technology 12(2017):0881-07

[42] 张礼，张保国，罗超，刘宜霖， 紫外光照射下GaN的电化学性质及CMP应用 [J] Micronanoelectronic Technology 12(2017):0858-06

[43] 潘柏臣，张保国，周朝旭 电化学研究在锗的化学机械抛光上的应用 [J] Chinese Journal of Rare Metals 10(2017):1137-06

[44] 周朝旭，罗超，张保国，王静辉，甄珍珍，李晓波，潘柏臣 LED制备中剥离技术的研究进展 [J] Micronanoelectronic Technology 12(2016):0846-07

[45] 潘柏臣，张保国，赵帅，周朝旭 用于最新技术节点Ge和SiGe的CMP [J] Micronanoelectronic Technology 09(2016):0623-07

[46] 周朝旭，张保国，王静辉，甄珍珍，李晓波，潘柏臣 LED倒装芯片Ni/Ag/Au结构反射层的退火工艺 [J] Semiconductor Manufacturing Technologies 11(2016):0842-05

[47] 张保国，刘玉玲 蓝宝石晶片加工中的技术关键和对策 [J] Journal of synthetic crystals 04(2016):0859-09

[48] Baoguo Zhang, Yuling Liu, Chenwei Wang BTA Free Alkaline Slurries Developed for Copper and Barrier CMP [J] ECS Journal of Solid State Science and Technology 04(2015):112-117

[49] BaoguoZhang, M.C.Fuerstenau Wastewater remediation with collophane [J] Minerals and Metallurgical Processing 03(2002):000

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